RASIRC Presents Hydrazine as Low Temperature Nitride Source at Critical Materials Conference

San Diego, CA, May 19, 2016 (Newswire.com) - RASIRC today announced that Chief Technology Officer Dan Alvarez, PhD presented Hydrazine as a Low Temperature Nitride Source: Materials Challenges for High Volume Manufacturing at the recent Critical Materials Conference. The conference , held May 5-6, 2016 in Hillsboro, Oregon, focused on materials and supply-chains for current and future semiconductor manufacturing.

The RASIRC presentation focused on hydrazine as a new molecule for Atomic Layer Deposition and thin film processing for advanced devices and 3D structures. RASIRC has observed an increasing need for low temperature nitride deposition for silicon nitride barrier layers and etch stops, multiple patterning, titanium nitride electrodes, tungsten nitride barrier layers, and barrier layers for copper. Ammonia is reaching limitations due to reduced thermal budgets and plasma methods may be overly aggressive or lead to non-uniformity in HAR structures. Studies show that gas phase hydrazine is a promising new material for these applications.

Hydrazine gas is highly reactive at low temperatures and shows higher growth rates, density and resistivity. The challenge is in delivering the gas in a safe and consistent manner, which we are able to do.

Daniel Alvarez, PhD, Chief Technology Officer

“Hydrazine gas is highly reactive at low temperatures and shows higher growth rates, density and resistivity,” said Alvarez. “The challenge is in delivering the gas in a safe and consistent manner, which we are able to do.”

Conference speakers and attendees were enthusiastic about the increased adoption of new materials and the consequent need for ALD. Hydrazine gas as described by Alvarez received a positive response. Alvarez used low temperature passivation on silicon germanium as an example of a plasma-free process that uses hydrazine to passivate the dangling bonds and maintaining an electrically unpinned surface ready for subsequent functionalization.

“Early process results using BRUTE Hydrazine are very positive and indicate that this molecule will help enable future technology nodes,” said Jeff Spiegelman, RASIRC President and Founder.

Contact RASIRC for a copy of the presentation and additional information on BRUTE™ Hydrazine at info@rasirc.com.

Source: RASIRC