Registration Open for UPW Micro 2010

Ultrapure Water Micro 2010 will feature technical papers on timely topics related to semiconductor water treatment. The Nov. 16 and 17 conference will also have an ITRS roundtable that will examine developments in industry UPW standards.

PHOENIX-Individuals active in semiconductor water treatment, or interested in learning more about this important segment should attend this fall's ULTRAPURE WATER Micro 2010. Registration is now open for the conference that is planned for Nov. 16-17 at the Hilton Hotel in Mesa (Phoenix). The meeting will feature 18 technical papers on important semiconductor water treatment topics, and an ITRS roundtable discussion.

This year's conference will offer papers in sessions that focus on semiconductor water treatment standards, system improvements, monitoring, and water reclaim and reuse. Among the speakers will be Michael Pischke of Alfa Laval Inc.; David O'Connor of Intel; Barry Carroll of Nalco; Jeff Chapman of IBM; and Slava Libman, Ph.D., of M+W U.S. Inc.

The conference will also feature tabletop exhibits, and offer attendees the chance to meet and network with others active in semiconductor water treatment.

Ultrapure Water, a technical journal that covers the business and technology of high-purity water treatment, sponsors the conference. More information about the conference is available at, by email at, or by calling 303/973-6700. On-line registration is available by visiting