Presentation + Paper
30 April 2023 Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers
Matthias F. Koch, Maria Russew, L. Scharfenberg, Andreas Benker, Arne Schleunitz, Gabi Grützner
Author Affiliations +
Abstract
Hybrid Polymers are a material class established in the industry for manufacturing of high-performance optical components, mainly patterned by (nano)imprint processes. Recently, the application range of Hybrid Polymers has been extended into bonding and passivation. In this context, patterning by classical UV-lithography has come into focus as an alternative patterning method to (nano)imprinting. By applying a two-stage curing process with a high intensity, low dose patterning step and a high dose flood exposure after development, it is possible to realize previously unattainable resolutions limits for Hybrid Polymers of 6μm L/S and aspect ratios of more than 3.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthias F. Koch, Maria Russew, L. Scharfenberg, Andreas Benker, Arne Schleunitz, and Gabi Grützner "Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970M (30 April 2023); https://doi.org/10.1117/12.2658408
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KEYWORDS
Polymers

Optical lithography

Lithography

Ultraviolet radiation

Passivation

Advanced patterning

Transparency

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